Scheme 1: Synthetic Routes of hybrid OV-POSS-A-CC-FH

Figure 1: FE-SEM micrographs of (a) Hybrid OV-POSS-A (b) Hybrid OV-POSS-A-CC. (c) Ac-FH. (d) Hybrid OV-POSS-A-CC-FH

Figure 2: (a) Fluorescence spectra of well hybrid OV-POSS-A-CC-FH in the presence of Cu2+ ions in water (λex=273 nm). (b) UV-Vis absorption of OV-POSS-A-CC-FH in the presence of different metal ions (1 equiv. each) in water. (c) Effect of pH on fluorescence intensity of hybrid OV-POSS-A-CC-FH in the absence and presence of Cu2+. (d) The fluorescent intensity changes of hybrid OV-POSS-A-CC-FH at 551 nm after the sequential addition of Cu2+ and EDTA in water, λex=273nm. (e) Changes of fluorescence intensity in the presence of 1.0 Equiv. Cu2+ as the function of time (0~20 min) in water, λex=273 nm. (f) Fluorescence histogram of hybrid OV-POSS-A-CC-FH in the presence of different metal ions

Figure 3: (a) Fluorescence spectra of hybrid OV-POSS-A-CC-FH upon the addition of Cu2+. With different concentrations, the insert shows the color change of Cu2+. Excited in the absence and presence of Cu2+, λex=273 nm, (b) A linear relationship between F/F0 and C (Cu2+). (c) The absorption spectra of OV-POSS-A-CC-FH upon the addition of Cu2+ with different concentrations. (d) A linear relationship between absorbance and C (Cu2+). (e) The visual and (f) fluorescent color changes of the OV-POSS-A-CC-FH probe in the presence of different metal ions in water

Figure 4: (a) The schematic illustration of the proposed binding mode between OV-POSS-A-CC-FH and Cu2+. (b) Job's plot of the OV-POSS-A-CC-FH-Cu2+ system. (c) FTIR spectra of OV-POSS-A-CC-FH without and in the presence of Cu2+, respectively. (d) H NMR spectra of OV-POSS-A-CC-FH without and in the presence of Cn2+, respectively [1]. (e)A certain linear relationship between reciprocal of relative fluorescence intensity [1/F-F0] and reciprocal of the concentration of Cu2+ solution λex=273 nm

Figure 5: The fluorescent images of L929 cells stained with OV-POSS-A-CC-FH for 24 h at 37 °C after which were cultured with (a) 0.0 nM, (b) 20 nM, (c) 40 nM, (d) 60 nM, (e) 80 nM, and (f) 100 nM Cu2+, respectively